QDev Seminar: Aga Telecka
Fabrication of nanostructured functional surfaces in polymer and silicon using self - assembly lithographic methods
Nanostructured surfaces have been extensively investigated by numerous of research groups in the past decade, due to the unique functionalities they add to the bulk material. Superhydrophobic and superhydrophilic nanostructured surfaces, where water is either fully repelled or completely spread on the material, are in high demand by the reason of wide commercial applications in self-cleaning and antifogging devices. Many high- resolution lithographic approaches including deep UV, X - ray or electron beam lithography have been investigated to manufacture such structures. Nevertheless , these techniques suffer from process complexity, high-cost and small patterned area issues, making them inappropriate for successful industrial implementation.